发明申请
- 专利标题: POLISHING APPARATUS
-
申请号: US16075331申请日: 2017-02-03
-
公开(公告)号: US20190038957A1公开(公告)日: 2019-02-07
- 发明人: Jonathan Rosser HISTED , Robin Craig COCKER , Paul Christopher Edward MUTTI
- 申请人: JRC INNOVATION LIMITED
- 优先权: GB1602164.4 20160205
- 国际申请: PCT/GB2017/050279 WO 20170203
- 主分类号: A63C3/10
- IPC分类号: A63C3/10 ; B24B3/00 ; B24D15/06
摘要:
The invention relates to apparatus for polishing a running base that comprises a blade with two opposing blade edges separated one from the other by an intermediate section; the polishing apparatus comprising: a support body, and blade alignment guide means; wherein the support body is capable of carrying a polishing surface which comprises: a profile which is adapted to conform with one or more portions of the intermediate section; and wherein the blade alignment guide means comprise one or more pairs of first and second blade alignment guides, which first and second blade alignment guides in each pair are separated from each other by the polishing surface, and further wherein the blade alignment guide means is adapted to receive and/or guide and/or constrain a running base so that when the intermediate section between the two edges of the running base is brought into contact with the polishing surface, there is no contact between the polishing surface and any part of the two opposing blade edges of the running base.
公开/授权文献
- US11369857B2 Polishing apparatus 公开/授权日:2022-06-28