发明申请
- 专利标题: PHOTO-CURABLE AND HEAT-CURABLE RESIN COMPOSITION AND DRY FILM SOLDER RESIST
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申请号: US15764544申请日: 2017-02-03
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公开(公告)号: US20190056658A1公开(公告)日: 2019-02-21
- 发明人: Byung Ju CHOI , You Jin KYUNG , Woo Jae JEONG , Bo Yun CHOI , Min Su JEONG
- 申请人: LG CHEM, LTD.
- 申请人地址: KR Seoul
- 专利权人: LG CHEM, LTD.
- 当前专利权人: LG CHEM, LTD.
- 当前专利权人地址: KR Seoul
- 优先权: KR10-2016-0015303 20160205
- 国际申请: PCT/KR2017/001214 WO 20170203
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/029 ; C08F122/14 ; H05K3/28
摘要:
The present invention relates to a photo-curable and heat-curable resin composition including: an acid-modified oligomer having a photo-curable functional group having an acrylate group or an unsaturated double bond, and a carboxyl group in the molecule; a photopolymerizable monomer having at least two photo-curable unsaturated functional groups; a heat-curable binder having a heat-curable functional group; a plate-like inorganic filler having an E-modulus of 90 to 120 (Gpa); a dispersant; and a photo-initiator, and a dry film solder resist prepared therefrom.
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