Invention Application
- Patent Title: GAS SEPARATION MEMBRANE, GAS SEPARATION MEMBRANE MODULE, AND GAS SEPARATION DEVICE
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Application No.: US16186606Application Date: 2018-11-12
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Publication No.: US20190076777A1Publication Date: 2019-03-14
- Inventor: Yusuke MOCHIZUKI , Atsushi MUKAI , Motoi HARADA , Makoto SAWADA
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2016-145267 20160725
- Main IPC: B01D53/22
- IPC: B01D53/22 ; B01D71/32 ; B01D71/40 ; B01D71/10 ; B01D71/64 ; B01D69/12 ; B01D71/70 ; B01D69/02

Abstract:
A gas separation membrane, the gas separation membrane module, and the gas separation device include a first separation layer, and a second separation layer, the first separation layer has an Si/C ratio of 0.3 or less, the Si/C ratio being a ratio of the number of silicon atoms to the number of carbon atoms at the interface of the first separation layer on the second separation layer side, the second separation layer has a maximum value of an F/C ratio of 0.20 or more, the F/C ratio being a ratio of the number of fluorine atoms to the number of carbon atoms, and an Si/C ratio of 0.3 or less in a portion where the F/C ratio is maximum.
Information query
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