Invention Application
- Patent Title: METHOD OF NANOSCALE PATTERNING BASED ON CONTROLLED PINHOLE FORMATION
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Application No.: US16099493Application Date: 2017-06-01
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Publication No.: US20190105812A1Publication Date: 2019-04-11
- Inventor: Yabing Qi , Luis Katsuya Ono
- Applicant: OKINAWA INSTITUTE OF SCIENCE AND TECHNOLOGY SCHOOL CORPORATION
- Applicant Address: JP Kunigami-gun, Okinawa
- Assignee: OKINAWA INSTITUTE OF SCIENCE AND TECHNOLOGY SCHOOL CORPORATION
- Current Assignee: OKINAWA INSTITUTE OF SCIENCE AND TECHNOLOGY SCHOOL CORPORATION
- Current Assignee Address: JP Kunigami-gun, Okinawa
- International Application: PCT/JP2017/020439 WO 20170601
- Main IPC: B29C41/12
- IPC: B29C41/12 ; B29C33/38 ; H01L51/00

Abstract:
A method of nanoscale patterning is disclosed. The method comprises: mixing predetermined amounts of a first solvent and a second solvent to generate a solvent, the first solvent and the second solvent being immiscible with each other; dissolving a solute material in the solvent to generate a coating material, the solute material having solubility that is higher in the first solvent than in the second solvent; and applying the coating material onto a substrate to form a plurality of pinholes in the coating material. The formation of the plurality of pinholes is associated with suspension drops mostly comprised of the second solvent, separated from the solute material dissolved in the first solvent, in the coating material. A method of making a stamp with a nanoscale pattern is also disclosed based on the above method.
Public/Granted literature
- US10981304B2 Method of nanoscale patterning based on controlled pinhole formation Public/Granted day:2021-04-20
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