发明申请
- 专利标题: METHOD AND A SYSTEM FOR XRF MARKING AND READING XRF MARKS OF ELECTRONIC SYSTEMS
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申请号: US16091222申请日: 2017-04-04
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公开(公告)号: US20190156075A1公开(公告)日: 2019-05-23
- 发明人: Yair GROF , Tzemah KISLEV , Nadav YORAN , Haggai ALON
- 申请人: SOREQ NUCLEAR RESEARCH CENTER , SECURITY MATTERS LTD.
- 申请人地址: IL Yavne IL D.N. Hevel Eilot
- 专利权人: Soreq Nuclear Research Center,Security Matters Ltd.
- 当前专利权人: Soreq Nuclear Research Center,Security Matters Ltd.
- 当前专利权人地址: IL Yavne IL D.N. Hevel Eilot
- 国际申请: PCT/IL2017/050404 WO 20170404
- 主分类号: G06K7/10
- IPC分类号: G06K7/10 ; G01N23/223
摘要:
Methods and systems for verifying compatibility of components (e.g. parts or devices) of an electronic system are disclosed. In certain embodiments the method includes: irradiating a first and second components presumably associated with the electronic system, with XRF exciting radiation, and detecting one or more XRF response signals indicative of a first and a second XRF signatures, emitted from the first and second components in response to the irradiation. Then the first and second XRF signatures are processed to determine whether they are associated with respectively a first and second XRF marking compositions on the first and second components, and the compatibility of the first and second components to the electronic system is determined/verified based on the correspondence between the first and a second XRF signatures/marking. Certain embodiments also disclose electronic systems including at least a first and a second electronic components/devices respectively having the first and second XRF marking compositions that enable verification of compatibility of the components. Certain embodiments disclose techniques for pairing the first and second components (e.g. devices) based a correspondence between the first and second XRF signatures/markings thereof. Certain embodiments disclose various calibration techniques for calibrating the XRF measurements of XRF markings applied to different substrate materials of the electronic components.
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