- 专利标题: FINE MASK SUPPORT FRAME, FINE MASK, AND METHOD FOR FABRICATING THE SAME
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申请号: US16301650申请日: 2018-01-05
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公开(公告)号: US20190177831A1公开(公告)日: 2019-06-13
- 发明人: Zhiming Lin , Baojun Li , Jian Zhang , Pu Sun , Chun Chieh Huang
- 申请人: BOE TECHNOLOGY GROUP CO., LTD. , ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
- 优先权: CN201710333242.6 20170512
- 国际申请: PCT/CN2018/071600 WO 20180105
- 主分类号: C23C14/04
- IPC分类号: C23C14/04 ; C23C14/24 ; H01L51/56
摘要:
This disclosure relates to the field of display fabrication technologies, and discloses a fine mask support frame, a fine mask, and a method for fabricating the same so as to improve the positional precision of opening areas of the mask to thereby further improve the precision of the mask. The fine mask support frame includes: a plurality of bezels surrounding a mask area, wherein adjustment openings are arranged on at least one pair of bezels arranged opposite to each other, and at least one adjustment piece is arranged on each of the adjustment openings, wherein the adjustment piece is configured to adjust a shape of a corresponding adjustment opening to thereby adjust deformation of the mask area.
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