- 专利标题: MAGNETIC THIN FILM LAMINATED STRUCTURE DEPOSITION METHOD, MAGNETIC THIN FILM LAMINATED STRUCTURE AND MICRO-INDUCTANCE DEVICE
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申请号: US16386750申请日: 2019-04-17
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公开(公告)号: US20190244736A1公开(公告)日: 2019-08-08
- 发明人: Yujie YANG , Peijun DING , Tongwen ZHANG , Wei XIA , Hougong WANG
- 申请人: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- 优先权: CN201610929057.9 20161031
- 主分类号: H01F3/02
- IPC分类号: H01F3/02 ; H01F17/04 ; H01F27/26 ; H01F41/02 ; H01F41/14
摘要:
A deposition method includes depositing an adhesive layer on a workpiece to be processed and depositing a magnetic/isolated unit, where the magnetic/isolation unit includes at least one pair of a magnetic film layer and an isolation layer that are alternately disposed. The deposition method of the magnetic thin film laminated structure, the magnetic thin film laminated structure and the micro-inductive device provided by the disclosure can increase a total thickness of the magnetic thin film laminated structure, thereby broadening the application frequency range of the inductive device fabricated thereby.
公开/授权文献
- US11699541B2 Magnetic thin film laminated structure deposition method 公开/授权日:2023-07-11
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