- 专利标题: SEMICONDUCTOR DEVICE HAVING JUNCTIONLESS VERTICAL GATE TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
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申请号: US16398109申请日: 2019-04-29
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公开(公告)号: US20190273081A1公开(公告)日: 2019-09-05
- 发明人: Jung-Min MOON , Tae-Kyun KIM , Seok-Hee LEE
- 申请人: SK hynix Inc. , Korea Advanced Institute of Science and Technology
- 优先权: KR10-2012-0024991 20120312
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L29/78 ; H01L29/10 ; H01L29/66
摘要:
A junctionless vertical gate transistor includes an active pillar vertically protruding from a substrate and including a first impurity region, a second impurity region and a third impurity region sequentially formed over the first impurity region; gate electrodes coupled to sidewalls of the second impurity region; and bit lines arranged in a direction of intersecting with the gate electrodes and each contacting the first impurity region. The first to the third impurity regions include impurities of the same polarity.
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