- 专利标题: METHOD OF PRODUCING COMPOSITE SUBSTRATE FOR SURFACE ACOUSTIC WAVE DEVICE
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申请号: US16318966申请日: 2017-05-23
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公开(公告)号: US20190280666A1公开(公告)日: 2019-09-12
- 发明人: Shoji AKIYAMA , Masayuki TANNO , Shozo SHIRAI
- 申请人: SHIN-ETSU CHEMICAL CO., LTD.
- 申请人地址: JP Tokyo
- 专利权人: SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人: SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2016-142751 20160720
- 国际申请: PCT/JP2017/019181 WO 20170523
- 主分类号: H03H3/08
- IPC分类号: H03H3/08 ; H03H9/25 ; H03H9/02
摘要:
Provided is a composite substrate for surface acoustic wave device which does not cause peeling of an entire surface of a piezoelectric single crystal film even when heating the film to 400° C. or higher in a step after bonding. The composite substrate is formed by providing a piezoelectric single crystal substrate and a support substrate, forming a film made of an inorganic material on at least one of the piezoelectric single crystal substrate and the support substrate, and joining the piezoelectric single crystal substrate with the support substrate so as to sandwich the film made of the inorganic material.
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