Invention Application
- Patent Title: LIQUID PROCESSING APPARATUS
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Application No.: US16274168Application Date: 2019-02-12
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Publication No.: US20190292076A1Publication Date: 2019-09-26
- Inventor: GAKU MIYAKE , GENICHIRO MATSUDA
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Priority: JP2018-054790 20180322
- Main IPC: C02F1/46
- IPC: C02F1/46 ; H05H1/48 ; C02F1/32

Abstract:
A liquid processing apparatus includes a processing tank, a liquid introduction port, a discharge portion, a first electrode, a second electrode, and a power supply. The liquid introduction port is disposed on a first end side of the processing tank, causes a liquid to swirl in the processing tank by introducing the liquid into the processing tank in a tangential direction of the processing tank, and generates a gas phase in a swirling flow of the liquid. The first electrode has a rod shape and is disposed at the first end on a central axis of the processing tank. The second electrode is disposed so as to be exposed to the discharge portion of the processing tank. A voltage is applied between the first electrode and the second electrode to generate plasma in the gas phase.
Public/Granted literature
- US10934183B2 Liquid processing apparatus Public/Granted day:2021-03-02
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