Invention Application
- Patent Title: METHOD AND SYSTEM USING X-RAY PINHOLE CAMERA FOR IN-SITU MONITORING OF ELECTRON BEAM MANUFACTURING PROCESS
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Application No.: US15941245Application Date: 2018-03-30
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Publication No.: US20190302043A1Publication Date: 2019-10-03
- Inventor: Vladimir Anatolievich Lobastov , Adrian Ivan , David Charles Bogdan, JR.
- Applicant: General Electric Company
- Main IPC: G01N23/2252
- IPC: G01N23/2252 ; B33Y30/00 ; B33Y50/02 ; B33Y10/00 ; B23K15/00 ; B23K15/02

Abstract:
An additive manufacturing system includes a cabinet, an electron beam system, at least one imaging device, and a computing device. The cabinet is configured to enclose a component and defines a pinhole extending therethrough. The electron beam system is configured to generate an electron beam directed toward the component. Interactions between the component and the electron beam generate x-ray radiation. The at least one imaging device is configured to detect the x-ray radiation through the pinhole. The computing device is configured to image the component based on the x-ray radiation detected by the at least one imaging device.
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