发明申请
- 专利标题: Radiation Source
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申请号: US16307376申请日: 2017-06-01
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公开(公告)号: US20190302570A1公开(公告)日: 2019-10-03
- 发明人: Nitish KUMAR , Simon Reinald HUISMAN
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 优先权: EP16173625.1 20160609
- 国际申请: PCT/EP2017/063356 WO 20170601
- 主分类号: G02F1/365
- IPC分类号: G02F1/365 ; H01S3/067
摘要:
A supercontinuum radiation source for an alignment mark measurement system comprises: a radiation source; illumination optics; a plurality of waveguides; and collection optics. The radiation source is operable to produce a pulsed radiation beam. The illumination optics is arranged to receive the pulsed pump radiation beam and to form a plurality of pulsed sub-beams, each pulsed sub-beam comprising a portion of the pulsed radiation beam. Each of the plurality of waveguides is arranged to receive at least one of the plurality of pulsed sub-beams beam and to broaden a spectrum of that pulsed sub-beam so as to generate a supercontinuum sub-beam. The collection optics is arranged to receive the supercontinuum sub-beam from each of the plurality of waveguides and to combine them so as to form a supercontinuum radiation beam.
公开/授权文献
- US10690995B2 Radiation source 公开/授权日:2020-06-23
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