Invention Application
- Patent Title: WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS
-
Application No.: US16472339Application Date: 2017-12-14
-
Publication No.: US20190378698A1Publication Date: 2019-12-12
- Inventor: Shu KUSANO , Yusuke HIRAYAMA
- Applicant: Tokyo Electron Limited
- Priority: JP2016-251571 20161226
- International Application: PCT/JP2017/044933 WO 20171214
- Main IPC: H01J37/32
- IPC: H01J37/32 ; G01N15/06

Abstract:
There is provision of a method of determining wastage including: processing a substrate using a plasma generated by multiple gases including fluorine gas; obtaining light emission intensity of each gas of the multiple gases including fluorine gas from the plasma, by an optical emission spectrometer (OES); and calculating a wastage rate of a particular expendable part from the obtained light emission intensity of each gas of the multiple gases including fluorine gas, with reference to a storage section storing a wastage rate of the particular expendable part in association with the light emission intensity of each gas of the multiple gases including fluorine gas.
Public/Granted literature
- US10763089B2 Wastage determination method and plasma processing apparatus Public/Granted day:2020-09-01
Information query