• Patent Title: WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS
  • Application No.: US16472339
    Application Date: 2017-12-14
  • Publication No.: US20190378698A1
    Publication Date: 2019-12-12
  • Inventor: Shu KUSANOYusuke HIRAYAMA
  • Applicant: Tokyo Electron Limited
  • Priority: JP2016-251571 20161226
  • International Application: PCT/JP2017/044933 WO 20171214
  • Main IPC: H01J37/32
  • IPC: H01J37/32 G01N15/06
WASTAGE DETERMINATION METHOD AND PLASMA PROCESSING APPARATUS
Abstract:
There is provision of a method of determining wastage including: processing a substrate using a plasma generated by multiple gases including fluorine gas; obtaining light emission intensity of each gas of the multiple gases including fluorine gas from the plasma, by an optical emission spectrometer (OES); and calculating a wastage rate of a particular expendable part from the obtained light emission intensity of each gas of the multiple gases including fluorine gas, with reference to a storage section storing a wastage rate of the particular expendable part in association with the light emission intensity of each gas of the multiple gases including fluorine gas.
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