Invention Application
- Patent Title: FILM FORMING METHOD AND FILM FORMING APPARATUS
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Application No.: US16508348Application Date: 2019-07-11
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Publication No.: US20200017963A1Publication Date: 2020-01-16
- Inventor: Taichi MONDEN
- Applicant: TOKYO ELECTRON LIMITED
- Priority: JP2018-133608 20180713
- Main IPC: C23C16/44
- IPC: C23C16/44 ; H01L21/02 ; C23C16/52

Abstract:
A film forming method includes forming a film by sequentially performing operations for each of a plurality of kinds of reaction gases, the operations being of storing the reaction gas in a storage part to raise a pressure in the storage part to a first pressure and then discharging the reaction gas into the process vessel, while continuously supplying the counter gas, and purging by repeating multiple times operations of storing a purge gas in the storage part provided in the reaction gas supply passage to raise the pressure in the storage part to a second pressure higher than the first pressure, and discharging the purge gas into the process vessel. A flow rate of the counter gas supplied into the process vessel in the purging is smaller than a flow rate of the counter gas supplied into the process vessel in the forming the film.
Public/Granted literature
- US11535932B2 Film forming method and film forming apparatus Public/Granted day:2022-12-27
Information query
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