- 专利标题: LIQUID EJECTION APPARATUS AND MAINTENANCE APPARATUS
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申请号: US16528832申请日: 2019-08-01
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公开(公告)号: US20200047507A1公开(公告)日: 2020-02-13
- 发明人: Hiroshi Nakai , Noriko Sato , Takahiro Kiuchi , Yoshinori Yamaguchi , Yuki Amauchi , Takashi Sasaki
- 申请人: CANON KABUSHIKI KAISHA
- 优先权: JP2018-151443 20180810
- 主分类号: B41J2/165
- IPC分类号: B41J2/165
摘要:
Provided are a liquid ejection apparatus and a maintenance apparatus capable of suppressing unintended movement of a wiping unit. The maintenance apparatus includes: a wiping unit configured to wipe the ejection opening surface of a liquid ejection head in which ejection openings over a length corresponding to the width of a print medium are formed; and a lock member configured to restrict movement of the wiping unit from a position to which the wiping unit is evacuated from the ejection opening surface.
公开/授权文献
- US11130341B2 Liquid ejection apparatus and maintenance apparatus 公开/授权日:2021-09-28
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