Embodiments herein describe techniques for a semiconductor device including a RRAM memory cell. The RRAM memory cell includes a substrate, a RRAM storage cell above the substrate, and a diode adjacent to the RRAM storage cell. The RRAM storage cell includes a first electrode located in a first metal layer above the substrate, a resistive switching material layer adjacent to the first electrode, and a second electrode adjacent to the resistive switching material layer. The second electrode is shared between the RRAM storage cell and the diode. The diode includes the second electrode shared with the RRAM storage cell, a semiconductor layer adjacent to the second electrode, and a third electrode located in a second metal layer above the substrate. Other embodiments may be described and/or claimed.