Invention Application
- Patent Title: GROUP III NITRIDE BASED HIGH ELECTRON MOBILITY TRANSISTORS
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Application No.: US16701951Application Date: 2019-12-03
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Publication No.: US20200105915A1Publication Date: 2020-04-02
- Inventor: Krishna Kumar Manippady , Surani Bin Dolmanan , Kaixin Vivian Lin , Hui Ru Tan , Sudhiranjan Tripathy
- Applicant: Agency for Science, Technology and Research
- Applicant Address: SG Singapore
- Assignee: Agency for Science, Technology and Research
- Current Assignee: Agency for Science, Technology and Research
- Current Assignee Address: SG Singapore
- Priority: SG201209560-0 20121226
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L21/02 ; H01L29/66 ; C30B25/02 ; C30B29/40

Abstract:
The invention provides a product and a manufacturing process for a high power semiconductor device. The semiconductor device comprises a GaN/AlGaN epilayer structure on an SOI substrate with a thick, uninterrupted GaN layer for use in high-power applications.
Public/Granted literature
- US10763348B2 Group III nitride based high electron mobility transistors Public/Granted day:2020-09-01
Information query
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