Invention Application
- Patent Title: METHOD AND SYSTEM FOR TUNABLE GRADIENT PATTERNING USING A SHADOW MASK
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Application No.: US16705127Application Date: 2019-12-05
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Publication No.: US20200110278A1Publication Date: 2020-04-09
- Inventor: Shuqiang Yang , Vikramjit Singh , Kang Luo , Nai-Wen Pi , Frank Y. Xu
- Applicant: Magic Leap, Inc.
- Applicant Address: US FL Plantation
- Assignee: Magic Leap, Inc.
- Current Assignee: Magic Leap, Inc.
- Current Assignee Address: US FL Plantation
- Main IPC: G02B27/42
- IPC: G02B27/42 ; G02B5/18 ; G02B27/00 ; G02B27/01

Abstract:
A method of depositing a variable thickness material includes providing a substrate and providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent the substrate and performing a plasma deposition process on the substrate to deposit the variable thickness material. A layer thickness adjacent the first region is greater than a layer thickness adjacent the second region.
Public/Granted literature
- US10747012B2 Method and system for tunable gradient patterning using a shadow mask Public/Granted day:2020-08-18
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