Invention Application
- Patent Title: CUTTING METHOD FOR FORMING CHAMFERED CORNERS
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Application No.: US16279186Application Date: 2019-02-19
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Publication No.: US20200147729A1Publication Date: 2020-05-14
- Inventor: HSIN-YU CHANG , FU-LUNG CHOU , CHIEN-JUNG HUANG , YU-CHUNG LIN , MIN-KAI LEE
- Applicant: Industrial Technology Research Institute
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@30b3555c
- Main IPC: B23K26/362
- IPC: B23K26/362

Abstract:
A cutting method for forming a chamfered corner includes a step of selecting a light pattern-adjusting module according to a pre-cut chamfer angle, a step of the light pattern-adjusting module emitting a laser beam to a substrate and thus forming a modified region extending in a thickness direction at the substrate, a step of the light pattern-adjusting module adjusting an axial energy distribution of a light pattern of the laser beam to vary an appearance of the modified region so as to form the modified region fulfilling the pre-cut chamfer angle, and a step of etching the substrate having the modified region to form a chamfered surface on the substrate by cutting the modified region from the substrate.
Public/Granted literature
- US11338392B2 Cutting method for forming chamfered corners Public/Granted day:2022-05-24
Information query
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