Invention Application
- Patent Title: HYDROXYL GROUP-CONTAINING AMINE-BASED SULFUR DIOXIDE AND SULFUROUS ACID ABSORBENT, AND METHOD FOR PREPARING THE SAME
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Application No.: US16454566Application Date: 2019-06-27
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Publication No.: US20200155997A1Publication Date: 2020-05-21
- Inventor: Hyun Joo LEE , Ung LEE , Hong Gon KIM , Shinhye CHO , He Won LEE
- Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Seoul
- Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Seoul
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@69d597d8
- Main IPC: B01D53/14
- IPC: B01D53/14 ; B01D53/50 ; B01D53/78 ; C07D487/08 ; C07D241/04 ; C07C215/40
Abstract:
The present disclosure relates to a hydroxyl group-containing amine-based sulfur dioxide and sulfurous absorbent, and a method for preparing the same. The absorbent uses an ionic liquid in the form of a salt including a diamine compound substituted with a hydroxyl group, and can be used as an absorbent capable of removing not only sulfur dioxide (SO2) but also sulfurous acid (H2SO3) formed by combination of sulfur dioxide with water.
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Information query
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