Invention Application
- Patent Title: A CLEAR-OUT TOOL, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
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Application No.: US16638790Application Date: 2018-07-19
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Publication No.: US20200183288A1Publication Date: 2020-06-11
- Inventor: Yang-Shan HUANG , Andre Bernardus JEUNINK , Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN , Victoria VORONINA
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@36680756
- International Application: PCT/EP2018/069601 WO 20180719
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A clear-out tool is described, the clear-out tool being configured to at least partially remove a masking layer from a target area of an object using a laser beam. The clear-out tool includes a barrier member configured to be arranged above a surface of the object containing the target area and configured to contain a liquid in a space next to the target area or surrounding the target area.
Information query
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