- 专利标题: Cu ALLOY BONDING WIRE FOR SEMICONDUCTOR DEVICE
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申请号: US16637653申请日: 2018-08-07
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公开(公告)号: US20200279824A1公开(公告)日: 2020-09-03
- 发明人: Tetsuya OYAMADA , Tomohiro UNO , Takashi YAMADA , Daizo ODA
- 申请人: NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. , NIPPON MICROMETAL CORPORATION
- 优先权: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@10de7cde
- 国际申请: PCT/JP2018/029589 WO 20180807
- 主分类号: H01L23/00
- IPC分类号: H01L23/00
摘要:
The present invention provides a bonding wire for a semiconductor device, where the bonding wire can inhibit wear of capillary. In a Cu alloy bonding wire for a semiconductor device, a total of abundance ratios of a crystal orientations and having an angular difference of 15 degrees or less from a direction perpendicular to one plane including a wire center axis is to crystal orientations on a wire surface 40% or more and 90% or less, in average area percentage.
公开/授权文献
- US10991672B2 Cu alloy bonding wire for semiconductor device 公开/授权日:2021-04-27
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