Invention Application
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
-
Application No.: US16561658Application Date: 2019-09-05
-
Publication No.: US20200294971A1Publication Date: 2020-09-17
- Inventor: Yusuke TANAKA , Atsushi Hieno , Tsutomu Nakanishi , Yasuhito Yoshimizu , Masayoshi Tagami
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Minato-ku
- Assignee: Toshiba Memory Corporation
- Current Assignee: Toshiba Memory Corporation
- Current Assignee Address: JP Minato-ku
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@57aeaf36
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L25/18 ; H01L23/00 ; H01L25/00

Abstract:
In one embodiment, a semiconductor device includes a first chip that includes a first interconnect layer, a first insulator provided on the first interconnect layer, a first metal portion provided on the first interconnect layer and provided in the first insulator and including at least one of palladium, platinum and gold, and a second interconnect layer provided on the first metal portion and provided in the first insulator. The device further includes a second chip that includes a second insulator provided on the first insulator, and a third interconnect layer provided in the second insulator and provided on the second interconnect layer.
Public/Granted literature
- US11152334B2 Semiconductor device and method of manufacturing the same Public/Granted day:2021-10-19
Information query
IPC分类: