Invention Application
- Patent Title: Level Sensor and Lithographic Apparatus
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Application No.: US17044674Application Date: 2019-03-13
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Publication No.: US20210072652A1Publication Date: 2021-03-11
- Inventor: Simon Reinald HUISMAN , Marinus Petrus REIJNDERS
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP18166754.4 20180411
- International Application: PCT/EP2019/056288 WO 20190313
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F7/20

Abstract:
The invention provides a level sensor to measure a position of a surface of a substrate, comprising a projection unit arranged to direct a beam of radiation to the surface of the substrate and a detection unit. The detection unit comprises a detection grating arranged to receive the beam of radiation reflected on the surface of the substrate, one or more detectors, one or more optical elements to direct the beam of radiation from the detection grating to the one or more detectors, and a processing unit to determine the position of the surface of the substrate on the basis of the beam of radiation received by the one or more detectors. The detection grating and the one or more optical elements are integrated in a single integrated optical element.
Public/Granted literature
- US11221565B2 Level sensor and lithographic apparatus Public/Granted day:2022-01-11
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