Invention Application
- Patent Title: Optimization of Semiconductor Cell of Vertical Field Effect Transistor (VFET)
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Application No.: US16941042Application Date: 2020-07-28
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Publication No.: US20210104550A1Publication Date: 2021-04-08
- Inventor: Jung Ho DO
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Main IPC: H01L27/118
- IPC: H01L27/118

Abstract:
A vertical field effect transistor (VFET) cell implementing a VFET circuit over a plurality of gate grids includes: a 1st circuit including at least one VFET and provided over at least one gate grid; and a 2nd circuit including at least one VFET and provided over at least one gate grid formed on a left or right side of the 1st circuit, wherein a gate of the VFET of the 1st circuit is configured to share a gate signal or a source/drain signal of the VFET of the 2nd circuit, and the 1st circuit is an (X−1)-contacted poly pitch (CPP) circuit, which is (X−1) CPP wide, converted from an X-CPP circuit which is X CPP wide and performs a same logic function as the (X−1)-CPP circuit, X being an integer greater than 1.
Public/Granted literature
- US11581338B2 Optimization of semiconductor cell of vertical field effect transistor (VFET) Public/Granted day:2023-02-14
Information query
IPC分类: