发明申请
- 专利标题: SYSTEMS AND METHODS FOR PRIVACY-PRESERVING FACEMASK-COMPLIANCE-LEVEL MEASUREMENT
-
申请号: US17247847申请日: 2020-12-26
-
公开(公告)号: US20210117649A1公开(公告)日: 2021-04-22
- 发明人: David Gonzalez Aguirre , Julio Zamora Esquivel , Javier Felip Leon , Ignacio J. Alvarez
- 申请人: David Gonzalez Aguirre , Julio Zamora Esquivel , Javier Felip Leon , Ignacio J. Alvarez
- 申请人地址: US OR Portland; MX Zapopan; US OR Hillsboro; US OR Portland
- 专利权人: David Gonzalez Aguirre,Julio Zamora Esquivel,Javier Felip Leon,Ignacio J. Alvarez
- 当前专利权人: David Gonzalez Aguirre,Julio Zamora Esquivel,Javier Felip Leon,Ignacio J. Alvarez
- 当前专利权人地址: US OR Portland; MX Zapopan; US OR Hillsboro; US OR Portland
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
Disclosed herein are systems and methods for privacy-preserving facemask-compliance-level measurement. In an embodiment, a mask-compliance measurement system includes a processor that is configured to generate, from an image of a person, a facial depth image of a region of a face of the person, and to generate facial wavelet descriptors from the facial depth image. The processor is also configured to determine spectral-density values of the wavelet descriptors, and to analyze the spectral-density values to generate a mask-wearing-compliance result for the person. In an embodiment, the analyzing includes using a classification model that is trained to classify sets of spectral-density values with respect to facemask wearing in images from which the spectral-density values were derived.
信息查询