发明申请
- 专利标题: CHARGED PARTICLE BEAM APPARATUS WITH MULTIPLE DETECTORS AND METHODS FOR IMAGING
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申请号: US17226017申请日: 2021-04-08
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公开(公告)号: US20210319977A1公开(公告)日: 2021-10-14
- 发明人: Xuedong LIU , Weimin ZHOU , Xiaoxue CHEN , Xiaoyu JI , Heng LI , Shahedul HOQUE , Zongyao LI , Shuhao LIU , Weiming REN
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: H01J37/28
- IPC分类号: H01J37/28 ; H01J37/145 ; H01J37/244 ; H01J37/147
摘要:
Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.
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