Invention Application
- Patent Title: WIRING STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
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Application No.: US16919967Application Date: 2020-07-02
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Publication No.: US20220005756A1Publication Date: 2022-01-06
- Inventor: Syu-Tang LIU , Tsung-Tang TSAI
- Applicant: Advanced Semiconductor Engineering, Inc.
- Applicant Address: TW Kaohsiung
- Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee Address: TW Kaohsiung
- Main IPC: H01L23/498
- IPC: H01L23/498 ; H01L21/48

Abstract:
A wiring structure includes a conductive structure and at least one conductive through via. The conductive structure includes a plurality of dielectric layers, a plurality of circuit layers in contact with the dielectric layers, and a plurality of dam portions in contact with the dielectric layers. The dam portions are stacked on and contact one another. The conductive through via extends through the dam portions.
Public/Granted literature
- US11257742B2 Wiring structure and method for manufacturing the same Public/Granted day:2022-02-22
Information query
IPC分类: