Invention Application
- Patent Title: MANUFACTURING MONITORING ASSISTANCE DEVICE, MANUFACTURING MONITORING ASSISTANCE METHOD, AND MANUFACTURING MONITORING ASSISTANCE PROGRAM
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Application No.: US17413417Application Date: 2020-01-30
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Publication No.: US20220057789A1Publication Date: 2022-02-24
- Inventor: Masanori KITAOKA , Hisashi ENDOU , Nobuhiro KAKENO , Hiroshi YOSHIKAWA , Toshihiro YAMADA
- Applicant: HITACHI, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI, LTD.
- Current Assignee: HITACHI, LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP2019-024966 20190215
- International Application: PCT/JP2020/003328 WO 20200130
- Main IPC: G05B19/418
- IPC: G05B19/418

Abstract:
A manufacturing monitoring assistance device includes: a model creation unit creating a computation model when a product as a sample is normal, based on a three-dimensional form acquired from the product; a simulation unit creating a corrective computation model when the product is abnormal, by adding a sample of an abnormal portion in the product to the created computation model, and performing a simulation on each of the computation model and the corrective computation model; and a monitoring method determination unit determining a method for monitoring a manufacturing process for the product, based on an abnormality index being a difference between an output from a sensor as a result of the simulation performed on the computation model and an output from a sensor as a result of the simulation performed on the corrective computation model, and causing an output device to display the determined method and the abnormality index.
Public/Granted literature
Information query
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