- 专利标题: LIGHT-EMITTING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, AND LIGHT- EMITTING APPARATUS
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申请号: US17393661申请日: 2021-08-04
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公开(公告)号: US20220069254A1公开(公告)日: 2022-03-03
- 发明人: Jun LIU , Jingang FANG , Yang ZHANG , Tongshang SU , Wei HE , Bin ZHOU , Ning LIU
- 申请人: HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- 申请人地址: CN Hefei; CN Beijing
- 专利权人: HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人: HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人地址: CN Hefei; CN Beijing
- 优先权: CN202010906721.4 20200901
- 主分类号: H01L51/52
- IPC分类号: H01L51/52 ; H01L27/32 ; H01L51/56
摘要:
A light-emitting substrate includes; a base, an isolation portion disposed on the base and located in an isolation region located outside a light-emitting region, and a second insulating pattern located in the light-emitting region. The isolation portion includes a first conductive pattern, a second conductive pattern and a first insulating pattern that are sequentially stacked on the base; an orthogonal projection of the first conductive pattern on the base is located within an orthogonal projection of the second conductive pattern on the base; and a side face of the first conductive pattern proximate to the light-emitting region and a corresponding side face of the second conductive pattern proximate to the light-emitting region have a first gap therebetween. A side face of the second insulating pattern proximate to the first insulating pattern and a side face of the first insulating pattern proximate to the second insulating pattern have a second gap therebetween.
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