Invention Application
- Patent Title: RAY-TRACING FOR AUTO EXPOSURE
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Application No.: US17528591Application Date: 2021-11-17
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Publication No.: US20220076482A1Publication Date: 2022-03-10
- Inventor: Jakub Boksansky , Oliver Mark Wright
- Applicant: NVIDIA Corporation
- Applicant Address: US CA Santa Clara
- Assignee: NVIDIA Corporation
- Current Assignee: NVIDIA Corporation
- Current Assignee Address: US CA Santa Clara
- Main IPC: G06T15/06
- IPC: G06T15/06 ; G06T15/20 ; G06T15/50

Abstract:
In various examples, a virtual light meter may be implemented along with ray tracing techniques in order to determine incident light values—e.g., incoming irradiance, incident radiance, etc.—for adjusting auto exposure values of rendered frames. For example, one or more rays may be used to sample incident light over a sampling pattern—such as a hemispherical sampling pattern—for any position in a virtual game environment. As a result, the incident light values may be sampled near a subject of interest in a scene or frame such that exposure values are consistent or stable regardless of the composition of the rendered frames.
Public/Granted literature
- US12190434B2 Ray-tracing for auto exposure Public/Granted day:2025-01-07
Information query
IPC分类:
G | 物理 |
G06 | 计算;推算或计数 |
G06T | 一般的图像数据处理或产生 |
G06T15/00 | 3D〔三维〕图像的加工 |
G06T15/06 | .光线跟踪 |