- 专利标题: EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEMS
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申请号: US17325327申请日: 2021-05-20
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公开(公告)号: US20220104336A1公开(公告)日: 2022-03-31
- 发明人: SUNGHYUP KIM , Myeongjun Gil , Yebin Nam , Sanghoon Lee , Injae Lee
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2020-0126588 20200929
- 主分类号: H05G2/00
- IPC分类号: H05G2/00 ; G03F7/20
摘要:
Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle.
公开/授权文献
- US11304287B1 Extreme ultraviolet light source systems 公开/授权日:2022-04-12
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