Invention Application
- Patent Title: EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEMS
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Application No.: US17325327Application Date: 2021-05-20
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Publication No.: US20220104336A1Publication Date: 2022-03-31
- Inventor: SUNGHYUP KIM , Myeongjun Gil , Yebin Nam , Sanghoon Lee , Injae Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2020-0126588 20200929
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20

Abstract:
Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle.
Public/Granted literature
- US11304287B1 Extreme ultraviolet light source systems Public/Granted day:2022-04-12
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