- 专利标题: Pulsed Cathodic Arc Deposition
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申请号: US17430026申请日: 2020-02-10
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公开(公告)号: US20220112591A1公开(公告)日: 2022-04-14
- 发明人: Jukka Kolehmainen
- 申请人: Oerlikon Surface Solutions AG, Pfäffikon
- 申请人地址: CH Pfäffikon
- 专利权人: Oerlikon Surface Solutions AG, Pfäffikon
- 当前专利权人: Oerlikon Surface Solutions AG, Pfäffikon
- 当前专利权人地址: CH Pfäffikon
- 国际申请: PCT/EP2020/000040 WO 20200210
- 主分类号: C23C14/32
- IPC分类号: C23C14/32 ; H01J37/34 ; H01J37/32
摘要:
An assembly for cathodic arc deposition of a material onto an article. The assembly includes a chamber for receiving an article to be coated and a rotating target. The rotatable target has a surface from which a plasma material is ejected. An anode ring is positioned a first distance from the surface of the rotatable target. The anode ring has an opening with a central axis that is parallel to a rotational axis of the rotatable target and offset a second distance from the rotational axis. A spark device is disposed in the chamber for generating an arc on the surface of the rotatable target. The assembly configured to direct a stream of charged particles ejected from the surface of the target through the opening of the anode ring to the article to be coated.
公开/授权文献
- US11851746B2 Pulsed cathodic arc deposition 公开/授权日:2023-12-26
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