Invention Application
- Patent Title: RESONANT PRESSURE SENSOR AND MANUFACTURING METHOD THEREFOR
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Application No.: US17566326Application Date: 2021-12-30
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Publication No.: US20220120627A1Publication Date: 2022-04-21
- Inventor: Takashi YOSHIDA , Yuusaku YOSHIDA , Atsushi YUMOTO , Yoshitaka SUZUKI
- Applicant: Yokogawa Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Yokogawa Electric Corporation
- Current Assignee: Yokogawa Electric Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2013-169638 20130819
- Main IPC: G01L7/08
- IPC: G01L7/08 ; G01L7/02 ; G01L9/00

Abstract:
A resonant pressure sensor includes a first substrate and a resonator. The first substrate includes a diaphragm and a projection disposed on the diaphragm. The resonator is disposed in the first substrate, a part of the resonator being included in the projection, and the resonator being disposed between a top of the projection and an intermediate level of the first substrate. The first substrate is an SOI substrate in which a silicon dioxide layer is inserted between a silicon substrate and a superficial silicon layer. The intermediate level of the first substrate is disposed in the silicon substrate, and the resonator is disposed in the projection included in the superficial silicon layer.
Public/Granted literature
- US11835413B2 Resonant pressure sensor and manufacturing method therefor Public/Granted day:2023-12-05
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