Invention Application
- Patent Title: ELECTROMAGNETIC WAVE ABSORPTION FILM, ELECTROMAGNETIC WAVE ABSORPTION SHEET
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Application No.: US17434978Application Date: 2020-02-06
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Publication No.: US20220142018A1Publication Date: 2022-05-05
- Inventor: Taiga MATSUSHITA
- Applicant: LINTEC Corporation
- Applicant Address: JP Tokyo
- Assignee: LINTEC Corporation
- Current Assignee: LINTEC Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2019-037839 20190301,JP2019-094552 20190520
- International Application: PCT/JP2020/004578 WO 20200206
- Main IPC: H05K9/00
- IPC: H05K9/00

Abstract:
An aspect of the present invention provides an electromagnetic wave absorption film that is less susceptible to the surrounding environment.
An electromagnetic wave absorption film 10 has: a planar base 20; a first electromagnetic wave absorption pattern 1 formed on the base 20; a second electromagnetic wave absorption pattern 2 formed on the base 20; and a third electromagnetic wave absorption pattern 3 formed on the base 20, wherein when A [GHz] is defined as a frequency at which an absorption amount of an electromagnetic wave absorbed by the first electromagnetic wave absorption pattern 1 exhibits its local maximum value in a range from 20 to 110 GHz, B [GHz] satisfies Expression (1), B [GHz] being the value of a frequency at which an absorption amount of an electromagnetic wave absorbed by the second electromagnetic wave absorption pattern 2 exhibits its local maximum value, and C [GHz] satisfies Expression (2), C [GHz] being the value of a frequency at which an absorption amount of an electromagnetic wave absorbed by the third electromagnetic wave absorption pattern 3 exhibits its local maximum value, 1.037×A≤B≤1.30×A Expression (1) 0.60×A≤C≤0.963×A Expression (2).
An electromagnetic wave absorption film 10 has: a planar base 20; a first electromagnetic wave absorption pattern 1 formed on the base 20; a second electromagnetic wave absorption pattern 2 formed on the base 20; and a third electromagnetic wave absorption pattern 3 formed on the base 20, wherein when A [GHz] is defined as a frequency at which an absorption amount of an electromagnetic wave absorbed by the first electromagnetic wave absorption pattern 1 exhibits its local maximum value in a range from 20 to 110 GHz, B [GHz] satisfies Expression (1), B [GHz] being the value of a frequency at which an absorption amount of an electromagnetic wave absorbed by the second electromagnetic wave absorption pattern 2 exhibits its local maximum value, and C [GHz] satisfies Expression (2), C [GHz] being the value of a frequency at which an absorption amount of an electromagnetic wave absorbed by the third electromagnetic wave absorption pattern 3 exhibits its local maximum value, 1.037×A≤B≤1.30×A Expression (1) 0.60×A≤C≤0.963×A Expression (2).
Public/Granted literature
- US11723181B2 Electromagnetic wave absorption film, electromagnetic wave absorption sheet Public/Granted day:2023-08-08
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