• Patent Title: ELECTROMAGNETIC WAVE ABSORPTION FILM, ELECTROMAGNETIC WAVE ABSORPTION SHEET
  • Application No.: US17434978
    Application Date: 2020-02-06
  • Publication No.: US20220142018A1
    Publication Date: 2022-05-05
  • Inventor: Taiga MATSUSHITA
  • Applicant: LINTEC Corporation
  • Applicant Address: JP Tokyo
  • Assignee: LINTEC Corporation
  • Current Assignee: LINTEC Corporation
  • Current Assignee Address: JP Tokyo
  • Priority: JP2019-037839 20190301,JP2019-094552 20190520
  • International Application: PCT/JP2020/004578 WO 20200206
  • Main IPC: H05K9/00
  • IPC: H05K9/00
ELECTROMAGNETIC WAVE ABSORPTION FILM, ELECTROMAGNETIC WAVE ABSORPTION SHEET
Abstract:
An aspect of the present invention provides an electromagnetic wave absorption film that is less susceptible to the surrounding environment.
An electromagnetic wave absorption film 10 has: a planar base 20; a first electromagnetic wave absorption pattern 1 formed on the base 20; a second electromagnetic wave absorption pattern 2 formed on the base 20; and a third electromagnetic wave absorption pattern 3 formed on the base 20, wherein when A [GHz] is defined as a frequency at which an absorption amount of an electromagnetic wave absorbed by the first electromagnetic wave absorption pattern 1 exhibits its local maximum value in a range from 20 to 110 GHz, B [GHz] satisfies Expression (1), B [GHz] being the value of a frequency at which an absorption amount of an electromagnetic wave absorbed by the second electromagnetic wave absorption pattern 2 exhibits its local maximum value, and C [GHz] satisfies Expression (2), C [GHz] being the value of a frequency at which an absorption amount of an electromagnetic wave absorbed by the third electromagnetic wave absorption pattern 3 exhibits its local maximum value, 1.037×A≤B≤1.30×A  Expression (1) 0.60×A≤C≤0.963×A  Expression (2).
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