Invention Application
- Patent Title: ACCESS LINE FORMATION FOR A MEMORY ARRAY
-
Application No.: US17671373Application Date: 2022-02-14
-
Publication No.: US20220165795A1Publication Date: 2022-05-26
- Inventor: Andrea Redaelli , Anna Maria Conti
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L21/3213 ; H01L21/768 ; H01L45/00 ; H01L23/528 ; H01L27/11514

Abstract:
Methods, systems, and devices for access line formation for a memory array are described. The techniques described herein may be used to fabricate access lines for one or more decks of a memory array. In some examples, one or more access lines of a deck may be formed using an independent processing step. For example, different fabrication processes may be used to form a plurality of access lines in a deck and to form the pillars (e.g., the memory cells) that are coupled with the access lines. In some examples, an offset between the access lines and the pillars may exist due to the components being fabricated in different processing steps.
Public/Granted literature
- US12082424B2 Access line formation for a memory array Public/Granted day:2024-09-03
Information query
IPC分类: