Invention Application
- Patent Title: A LITHOGRAPHIC APPARATUS AND RELATED METHODS
-
Application No.: US17600340Application Date: 2020-03-10
-
Publication No.: US20220171298A1Publication Date: 2022-06-02
- Inventor: Alisia Mariska WILLEMS - PETERS , Sander BALTUSSEN , Zhuangxiong HUANG , Reinier Theodorus Martinus JILISEN , Sietse WIJTVLIET
- Applicant: ASML Netherlands B,V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B,V.
- Current Assignee: ASML Netherlands B,V.
- Current Assignee Address: NL Veldhoven
- Priority: EP19166555.3 20190401
- International Application: PCT/EP2020/056332 WO 20200310
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
An apparatus comprising: a position monitoring system configured to determine the position of the substrate with respect to a projection system configured to project a radiation beam through an opening in the projection system and onto a substrate, wherein a component of the position monitoring system is located beneath the projection system in use; and a baffle disposed between the opening and the component.
Public/Granted literature
- US11703768B2 Lithographic apparatus and related methods Public/Granted day:2023-07-18
Information query
IPC分类:
