Invention Application
- Patent Title: TWO-STAGE OFFGAS SCRUBBING
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Application No.: US17560226Application Date: 2021-12-22
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Publication No.: US20220226768A1Publication Date: 2022-07-21
- Inventor: Stephan Peitz , Guido Stochniol , Martin Oldemeyer , Matthias Böse
- Applicant: Evonik Operations GmbH
- Applicant Address: DE Essen
- Assignee: Evonik Operations GmbH
- Current Assignee: Evonik Operations GmbH
- Current Assignee Address: DE Essen
- Priority: EP21151735.4 20210115
- Main IPC: B01D53/14
- IPC: B01D53/14 ; C07C51/44 ; C07C51/12
Abstract:
The invention provides a process for removing organic constituents from a gas stream in a two-stage scrubbing operation, in which scrubbing is performed firstly with an alcoholic scrubbing medium and then with an aqueous scrubbing medium. The laden scrubbing media obtained can be used in certain (chemical) processes.
Public/Granted literature
- US12274975B2 Two-stage offgas scrubbing Public/Granted day:2025-04-15
Information query
IPC分类:
