Invention Application
- Patent Title: Block copolymer with improved resistance to sebum
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Application No.: US17614835Application Date: 2020-05-27
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Publication No.: US20220242994A1Publication Date: 2022-08-04
- Inventor: Blandine TESTUD , Quentin PINEAU
- Applicant: Arkema France
- Applicant Address: FR Colombes
- Assignee: Arkema France
- Current Assignee: Arkema France
- Current Assignee Address: FR Colombes
- Priority: FRFR1905746 20190529
- International Application: PCT/FR2020/050888 WO 20200527
- Main IPC: C08F293/00
- IPC: C08F293/00 ; C08L77/12
Abstract:
The present invention concerns the use of PCL in preparing a block copolymer comprising at least one rigid block and at least one flexible block, for enhancing the sebum resistance of said block copolymer.
The present invention also provides a sebum-resistant block copolymer, characterized in that it comprises rigid blocks and flexible blocks comprising at least 50% by weight of PCL, based on the total weight of flexible blocks, which represents 100%; a process for synthesizing said copolymer; and also compositions and articles comprising a sebum-resistant copolymer of this kind.
The present invention also provides a sebum-resistant block copolymer, characterized in that it comprises rigid blocks and flexible blocks comprising at least 50% by weight of PCL, based on the total weight of flexible blocks, which represents 100%; a process for synthesizing said copolymer; and also compositions and articles comprising a sebum-resistant copolymer of this kind.
Information query
