• Patent Title: COMPOSITION FOR HEAT CYCLE SYSTEM, AND HEAT CYCLE SYSTEM
  • Application No.: US17724672
    Application Date: 2022-04-20
  • Publication No.: US20220259474A1
    Publication Date: 2022-08-18
  • Inventor: Hidekazu Okamoto
  • Applicant: AGC Inc.
  • Applicant Address: JP Chiyoda-ku
  • Assignee: AGC Inc.
  • Current Assignee: AGC Inc.
  • Current Assignee Address: JP Chiyoda-ku
  • Priority: JP2014-033346 20140224,JP2014-127748 20140620
  • Main IPC: C09K5/04
  • IPC: C09K5/04 F25B13/00
COMPOSITION FOR HEAT CYCLE SYSTEM, AND HEAT CYCLE SYSTEM
Abstract:
To provide a composition for a heat cycle system comprising trifluoroethylene (HFO-1123), which has a low global warming potential and excellent cycle performance of HFO-1123 and which has high durability, and a heat cycle system employing the composition, which has less influence over global warming and has both high cycle performance and durability.
A composition for a heat cycle system, which comprises a working fluid for heat cycle containing trifluoroethylene, and a radical scavenger, and a heat cycle system employing the composition for a heat cycle system.
Information query
Patent Agency Ranking
0/0