Invention Application
- Patent Title: Manufacturing Method for Diffraction Grating Waveguide of Near-eye Display
-
Application No.: US17631470Application Date: 2019-08-28
-
Publication No.: US20220276419A1Publication Date: 2022-09-01
- Inventor: Xiaojun LI
- Applicant: National Center for Nanoscience and Technology, China
- Applicant Address: CN Beijing
- Assignee: National Center for Nanoscience and Technology, China
- Current Assignee: National Center for Nanoscience and Technology, China
- Current Assignee Address: CN Beijing
- Priority: CN201910707421.0 20190801
- International Application: PCT/CN2019/103035 WO 20190828
- Main IPC: G02B5/18
- IPC: G02B5/18 ; G03F7/00 ; B29C33/38

Abstract:
Some embodiments of the present disclosure relate to a manufacturing method using nano-imprint lithography for a diffraction grating waveguide of a near-eye display. The manufacturing method includes: manufacturing an imprint lithography template with a diffraction grating waveguide pattern; transferring the diffraction grating waveguide pattern of the imprint lithography template to a transferring template by nano-imprint lithography, so as to obtain a transferring template with a reverse pattern of the diffraction grating waveguide pattern; and transferring the reverse pattern of the diffraction grating waveguide pattern of the transferring template to a waveguide substrate by nano-imprint lithography, so as to obtain the diffraction grating waveguide of the near-eye display.
Public/Granted literature
- US12174403B2 Manufacturing method for diffraction grating waveguide of near-eye display Public/Granted day:2024-12-24
Information query