Invention Application
- Patent Title: METHOD AND SYSTEM FOR DETERMINING INFORMATION ABOUT A TARGET STRUCTURE
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Application No.: US17629053Application Date: 2020-07-17
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Publication No.: US20220276569A1Publication Date: 2022-09-01
- Inventor: Arie Jeffrey DEN BOEF , Kaustuve BHATTACHARYYA , Keng-Fu CHANG , Simon Gijsbert Josephus MATHIJSSEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP19188241.4 20190725
- International Application: PCT/EP2020/070284 WO 20200717
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
Methods and systems for determining information about a target structure are disclosed. In one arrangement, a value of an asymmetry indicator for the target structure is obtained. The value of the asymmetry indicator represents an amount of an overlay independent asymmetry in the target structure. An error in an initial overlay measurement performed on the target structure at a previous time is estimated. The estimation is performed using the obtained value of the asymmetry indicator and a relationship between values of the asymmetry indicator and overlay measurement errors caused at least partially by overlay independent asymmetries. An overlay in the target structure is determined using the initial overlay measurement and the estimated error.
Public/Granted literature
- US12061421B2 Method and system for determining information about a target structure Public/Granted day:2024-08-13
Information query
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