Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND METHOD WITH IMPROVED CONTAMINANT PARTICLE CAPTURE
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Application No.: US17624901Application Date: 2020-06-04
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Publication No.: US20220276573A1Publication Date: 2022-09-01
- Inventor: Marcus Adrianus VAN DE KERKHOF , Manish RANJAN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP19185209.4 20190709
- International Application: PCT/EP2020/065529 WO 20200604
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A lithographic apparatus including a substrate stage for supporting a structure in a compartment, the compartment having a compartment surface facing a top surface of the substrate in at least one operational configuration; and a soft coating on the compartment surface for capturing particles. A heat shield or component thereof for a lithographic apparatus, the heat shield or component thereof including a soft coating on at least one surface for capturing particles and a lithographic apparatus including such a heat shield.
Public/Granted literature
- US12158706B2 Lithographic apparatus and method with improved contaminant particle capture Public/Granted day:2024-12-03
Information query
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