Invention Application
- Patent Title: METHODS AND SYSTEMS FOR FORMING A LAYER COMPRISING VANADIUM AND NITROGEN
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Application No.: US17680761Application Date: 2022-02-25
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Publication No.: US20220285146A1Publication Date: 2022-09-08
- Inventor: Giuseppe Alessio Verni , Ren-Jie Chang , Qi Xie , Timothee Blanquart , Eric Shero
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L27/108
Abstract:
Disclosed are methods and systems for depositing layers comprising a metal and nitrogen. The layers are formed onto a surface of a substrate. The deposition process may be a cyclical deposition process. Exemplary structures in which the layers may be incorporated include field effect transistors, VNAND cells, metal-insulator-metal (MIM) structures, and DRAM capacitors.
Information query
IPC分类:
