Invention Application
- Patent Title: CLEANING METHOD FOR EXTREME ULTRAVIOLET LIGHT REFLECTION MIRROR
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Application No.: US17654701Application Date: 2022-03-14
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Publication No.: US20220334383A1Publication Date: 2022-10-20
- Inventor: Gouta NIIMI
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Priority: JP2021-071040 20210420
- Main IPC: G02B27/00
- IPC: G02B27/00 ; B08B7/00 ; B08B5/02 ; G03F7/20 ; C23C14/34 ; C23C14/18 ; C23C14/28 ; B24C1/00

Abstract:
A cleaning method for an extreme ultraviolet light reflection mirror includes a contacting step of bringing α-tin into contact with solid tin debris attached to an extreme ultraviolet light reflection mirror and an aging step of leaving the tin debris brought into contact with the α-tin in a temperature environment below a freezing point to promote turning into tin pest of the tin debris. The cleaning method further includes a removing step of removing the tin debris turned into tin pest from the extreme ultraviolet light reflection mirror.
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