- 专利标题： A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS
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申请号： US17761475申请日： 2020-09-03
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公开(公告)号： US20220350260A1公开(公告)日： 2022-11-03
- 发明人: Armand Eugene Albert , Justin Lloyd KREUZER , Nikhil MEHTA , Patrick WARNAAR , Vasco Tomas TENNER , Patricius Aloysius Jacobus TINNEMANS , Hugo Augustinus Joseph CRAMER
- 申请人： ASML Holding N.V. , ASML Netherlands B.V.
- 申请人地址： NL Veldhoven; NL Veldhoven
- 专利权人： ASML Holding N.V.,ASML Netherlands B.V.
- 当前专利权人： ASML Holding N.V.,ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven; NL Veldhoven
- 优先权： EP19203613.5 20191016
- 国际申请： PCT/EP2020/074621 WO 20200903
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G01N21/956 ; G01N21/95
摘要：
Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.
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