Invention Application
- Patent Title: MASK
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Application No.: US17761245Application Date: 2020-09-01
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Publication No.: US20220362100A1Publication Date: 2022-11-17
- Inventor: Beom Sun HONG , Hae Rok SON , Gyu Lin LEE , Min Seok OH , Mi Sun LEE
- Applicant: LG INNOTEK CO., LTD.
- Applicant Address: KR Seoul
- Assignee: LG INNOTEK CO., LTD.
- Current Assignee: LG INNOTEK CO., LTD.
- Current Assignee Address: KR Seoul
- Priority: KR10-2019-0114056 20190917,KR10-2019-0161440 20191206
- International Application: PCT/KR2020/011699 WO 20200901
- Main IPC: A61H23/02
- IPC: A61H23/02

Abstract:
A mask according to an embodiment comprises: a body having a shape corresponding to a user's face; a first recess disposed on one surface of the body, opposite to the user's face; and a piezoelectric part disposed in the first recess, wherein the first recess has a shape recessed outward from the one surface of the body and is disposed in a region corresponding to at least one of the user's brow region and eye rim regions, and the piezoelectric unit protrudes beyond the one surface toward the user.
Information query