Invention Application
- Patent Title: PHOTORESIST STRIPPING COMPOSITION
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Application No.: US17634071Application Date: 2019-08-30
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Publication No.: US20220365440A1Publication Date: 2022-11-17
- Inventor: Xin Jiang , Stephen W. King
- Applicant: Dow Global Technologies LLC
- Applicant Address: US MI Midland
- Assignee: Dow Global Technologies LLC
- Current Assignee: Dow Global Technologies LLC
- Current Assignee Address: US MI Midland
- International Application: PCT/CN2019/103614 WO 20190830
- Main IPC: G03F7/42
- IPC: G03F7/42 ; C07C217/08
Abstract:
A photoresist stripping composition comprising an organic amine and a method is provided. The photoresist stripping composition comprising an organic amine having the following formula (1).
Public/Granted literature
- US12242198B2 Photoresist stripping composition Public/Granted day:2025-03-04
Information query
IPC分类:
