- 专利标题: SEMICONDUCTOR DEVICES
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申请号: US17575856申请日: 2022-01-14
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公开(公告)号: US20220406919A1公开(公告)日: 2022-12-22
- 发明人: Beomjin PARK , Myunggil Kang , Dongwon Kim , Keunhwi Cho
- 申请人: SAMSUNG ELECTRONICS CO., LTD.
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2021-0079225 20210618
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L29/78
摘要:
A semiconductor device includes: an active region extending on a substrate in a first direction; a plurality of semiconductor layers spaced apart from each other vertically on the active region, including a lower semiconductor layer and an uppermost semiconductor layer disposed above the lower semiconductor layer and having a thickness greater than that of the lower semiconductor layer; a gate structure extending on the substrate in a second direction, perpendicular to the first direction, and including a gate electrode at least partially surrounding each of the plurality of semiconductor layers; a spacer structure disposed on both sidewalls of the gate structure; and source/drain regions disposed on the active region on both sides of the gate structure and contacting the plurality of semiconductor layers.
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